Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator

26th Symposium on Plasma Sciences for Materials

物理学;材料科学

Tateishi, M.^1 ; Koga, K.^1 ; Yamashita, D.^1 ; Kamataki, K.^2 ; Seo, H.^1 ; Itagaki, N.^1,3 ; Shiratani, M.^1 ; Ashikawa, N.^4 ; Masuzaki, S.^4 ; Nishimura, K.^4 ; Sagara, A.^4

Faculty of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan^1

Fuculty of Arts and Science, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan^2

PRESTO Japan Science and Technology Agency, 5 Sanban-cho, Chiyoda-ku Tokyo 4102-0075, Japan^3

National Institute for Fusion Science, 322-6 Oroshi-cho, Toki-city Gifu 509-5292, Japan^4

关键词: Dust flux;    Dust particle;    Graphite target;    H2 plasma;    Ion density;    Plasma columns;    Radial profiles;    Spherical particle;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/518/1/012009/pdf
DOI  :  10.1088/1742-6596/518/1/012009

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

We have studied contribution of H2 plasma etching to radial profile of amount of dust particles generated due to interactions between H2 plasmas and graphite target in a divertor simulator. Dust fluxes of spherical particles and flakes are the maximum at the distance r 100 mm and 120 mm from the centre axis of the plasma column, respectively. From ion density and dust flux, we have deduced etched volume of deposited dust particles due to H2 plasma irradiation. Sum of the etched volume and measured volume of spherical dust particles is almost constant for r120 mm, whereas that of flakes is the maximum at r 120 mm. H2 plasma etching significantly reduces size of dust particles for r smaller than 100 mm.