Pulsed laser deposition of carbon nanodots

15th Latin American Workshop on Plasma Physics; 21st IAEA TM on Research Using Small Fusion Devices

Muñoz, G.^1 ; Homm, P.^1 ; Guzmán, F.^3 ; Ruiz, H.M.^1 ; Caballero, L.S.^1 ; Favre, M.^1,2 ; Flores, M.^3 ; Hevia, S.^1,2

Instituto de Física, Pontificia Universidad Católica de Chile, Av. Vicuña Mackenna 4860, Santiago, Chile^1

Centro de Investigación en Nanotecnología y Materiales Avanzados (CIEN-UC), Av. Vicuña Mackenna 4860, Santiago, Chile^2

Departamento de Física, Facultad de Ciencias Físicas y Matemáticas, Universidad de Chile, Av. Blanco Encalada 2008, Santiago, Chile^3

关键词: Background pressure;    Carbon nanodots;    Characteristic energy;    Graphite target;    Optical emission spectroscopies (OES);    Porous alumina membranes;    Silicon substrates;    Thin carbon films;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/591/1/012047/pdf
DOI  :  10.1088/1742-6596/591/1/012047

来源: IOP

【 摘 要 】

We present preliminary results on carbon nanodots growth using pulsed laser deposition (PLD), with a graphite target, in a low pressure argon background. In the process thin carbon films are deposited on Porous Alumina Membranes (PAM) positioned over a Silicon substrate. Reproducible carbon nanodots arrays standing on Silicon are obtained by later removal of the PAM. Atomic force microscopy (AFM) was used to characterize the nanodots morphology. The laser carbon plasma was characterized by optical emission spectroscopy (OES), and a fast response, negative biased, Faraday cup was used to measure the characteristic energy and flux of the plasma ions depositing onto the PAM. Reliable Carbon nanodots growth was only observed with Argon background pressures below 18 mTorr.