The role of Pd over layer thickness on PLD YBCO coated conductor properties

11th European Conference on Applied Superconductivity

Mancini, A.^1 ; Rizzo, F.^1 ; Rufoloni, A.^1 ; Fabbri, F.^1 ; Augieri, A.^1 ; Vannozzi, A.^1 ; Thalmaier, G.^2 ; Petrisor, T.^2 ; Armenio, A Angrisani^1 ; Galluzzi, V.^1 ; Celentano, G.^1

ENEA Frascati Research Centre, Via E. Fermi 45, Frascati

I-00044, Italy^1

Technical University of Cluj, Cluj-Napoca

3400, Romania^2

关键词: Buffer layer structures;    Layer thickness;    Low temperature annealing;    Oxide phasis;    Pd film;    PLD-YBCO;    Substrate oxidation;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/507/2/022018/pdf
DOI  :  10.1088/1742-6596/507/2/022018

来源: IOP

【 摘 要 】

Varying the thickness of the Pd layer, the role of the Pd films deposited on the cube-textured Ni-based substrates, was assessed in order to investigate the issues related to substrate oxidation phenomena and their impact on the quality of the buffer layer structures. Using a low temperature annealing, 600 °C, a threshold for the Pd film thickness, beyond which the Pd layer hinders the oxides formation on the substrate, can be defined. When the Pd-Ni interdiffusion is complete, oxide phases of Ni and of Ni-W coexist in the substrate. Besides, at temperatures as high as 800°C, the NiWO4formation is favoured as the thickness of the Pd layer increases. Despite of these phenomena, development of a buffer layer template suitable for YBCO growth are reported with a thickness for the Pd layer as low as 20 nm.