X-ray Full Field Microscopy at 30 keV

22nd International Congress on X-Ray Optics and Microanalysis

Marschall, F.^1 ; Last, A.^1 ; Simon, M.^2 ; Kluge, M.^1 ; Nazmov, V.^1 ; Vogt, H.^1 ; Ogurreck, M.^3 ; Greving, I.^3 ; Mohr, J.^1

Institute of Microstructure Technology, Karlsruhe Institute of Technology (KIT/IMT), Germany^1

PI MiCos GmbH, Freiburger Straße 30, 79427 Eschbach, Germany^2

Helmholtz-Zentrum Geesthacht, Institute of Materials Research, Germany^3

关键词: Compound refractive lens;    Deep X-ray lithography;    Field of views;    Full-field microscopy;    Illumination optics;    Imaging lens;    Numerical aperture;    X-ray prism lens;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/499/1/012007/pdf
DOI  :  10.1088/1742-6596/499/1/012007

来源: IOP

【 摘 要 】

In our X-ray full field microscopy experiments, we demonstrated a resolution better than 260 nm over the entire field of view of 80 μm × 80 μm at 30 keV. Our experimental setup at PETRA III, P05, had a length of about 5 m consisting of an illumination optics, an imaging lens and a detector. For imaging, we used a compound refractive lens (CLR) consisting of mr-L negative photo resist, which was fabricated by deep X-ray lithography. As illumination optics, we choose a refractive rolled X-ray prism lens, which was adapted to the numerical aperture of the imaging lens.