The effect of thickness and loading force on wear behavior of HfO2

14th International Conference on Metrology and Properties of Engineering Surfaces

He, B.-C.^1 ; Fu, W.-E.^1 ; Chang, Y.-Q.^1 ; Liou, H.-C.^1

Centers for Measurement Standards, Industrial Technology Research Institute, No.321, Sec.2, Kuangfu Rd., Hsinchu, 30011, Taiwan^1

关键词: Annealing condition;    Annealing treatments;    Coefficient of frictions;    Deformation mechanism;    Induced crystallization;    Larger deformations;    Polycrystalline structure;    Tribological properties;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/483/1/012023/pdf
DOI  :  10.1088/1742-6596/483/1/012023

来源: IOP

【 摘 要 】

The effect of annealing treatment on hafnium oxide (HfO2) thin films with two thicknesses (20 and 50 nm) has been observed. The surface morphology and tribological properties of HfO2 thin films were measured through atomic force microscopy (AFM). It is found that annealing treatment and increasing thickness of thin film would promote the formation and growth of island-like grains, which contributes a raise in surface roughness. During scratch test, plowing behavior dominated the deformation mechanism in the form of lumps along the edge of grooves by AFM-3D images. Besides, slower scratch speed led to larger deformation energy and caused a serious fracture. The annealing-induced crystallization resulted in reduced penetration depth and coefficient of friction (COF). The varied COF with respect to different normal forces reflected substrate effect. The thicker HfO2 films exhibited better wear resistance regardless of annealing conditions. It is because that increase in film thickness accompanied growth of polycrystalline structure.