On the separation of arc discharge plasma near the sputtering cathode

Low temperature Plasma in the Processes of Functional Coating Preparation

Pankin, N.A.^1 ; Smolanov, N.A.^1

Ogarev Mordovia State University, Bolshevistskaya St. 68, Saransk 430005, Russia^1

关键词: Arc discharge plasmas;    Coating thickness;    Electric and magnetic fields;    Film condensations;    Molecular dynamics simulations;    Motion of atoms;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/479/1/012006/pdf
DOI  :  10.1088/1742-6596/479/1/012006

来源: IOP

【 摘 要 】

In the method of the molecular dynamics simulation of the motion of atoms and ions of titanium in spatial inhomogeneous electric and magnetic fields. An attempt is made to explain the experimental distribution of the coating thickness on the surface of the condensed ring anode installation NNV, at the film condensation method with ion bombardment.