Application of taguchi's design of experiments in optimization of metal assisted chemical etching process

International Conference on Innovative Research - ICIR EUROINVENT 2019

Nordin, N.M.^1 ; Azhari, A.W.^1^2 ; Halin, D.S.C.^2 ; Hashim, U.^3 ; Zaidi, S.H.^4

Water Research Group (WAREG), School of Environmental Engineering, Universiti Malaysia Perlis, Arau, Perlis

02600, Malaysia^1

Centre of Excellence Geopolymer and Green Technology (CEGeoGTech), School of Material Engineering, Universiti Malaysia Perlis, Arau, Perlis

02600, Malaysia^2

Institute of Nano Electronic Engineering, Universiti Malaysia Perlis, Arau, Perlis

02600, Malaysia^3

Solar Energy Research Institute, Universiti Kebangsaan Malaysia, Bangi, Selangor, Malaysia^4

关键词: Etchant concentrations;    Etching rate;    Field emission scanning electron microscopy;    Metal-assisted chemical etching;    Predicted models;    Process parameters;    Taguchi's design of experiments;    Taguchi's methods;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/572/1/012059/pdf
DOI  :  10.1088/1757-899X/572/1/012059

来源: IOP

【 摘 要 】

In this study, statistical analysis using Taguchi's method was used to investigate the effects of various process parameters involved in metal assisted chemical etching (MACE) of silicon. The process parameters that include etching time and various etchant concentration were selected and visualized in Taguchi modelling. Each sample was then characterized using the field emission scanning electron microscopy (FESEM). All data was then analysed and evaluated using ANOVA and graph modelling in order to visualize the interaction of each model. Results showed that for etching rate, separation and size of Si nanowires, the predicted model is in agreement with the experimental data with R2 of 0.94, 0.99 and 0.98 respectively.