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1 Geometric-Phase Polarization Fan-out Grating Fabricated with Deep-UV Interference Lithography [会议论文]
作者:Wan, Chenhao^1,2;Lombardo, David^2;Sarangan, Andrew^2;等
关键词:1550 nm;Coherent beam combining;...
会议举办机构:School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan
会议时间:2017
作者:Kagias, Matias^1,2;Pandeshwar, Amogha^2;Wang, Zhentian^1,2;等
关键词:Dark field imaging;Grating design;...
会议举办机构:Swiss Light Source, Paul Scherrer Institute, Villigen, Switzerland^1
会议时间:2017