Geometric-Phase Polarization Fan-out Grating Fabricated with Deep-UV Interference Lithography

6th conference on Advances in Optoelectronics and Micro/nano-optics

Wan, Chenhao^1,2 ; Lombardo, David^2 ; Sarangan, Andrew^2 ; Zhan, Qiwen^2

School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan

430074, China^1

Department of Electro-Optics and Photonics, University of Dayton, Dayton

45469, United States^2

关键词: 1550 nm;    Coherent beam combining;    Deep uv;    Fan Out;    Geometric phase;    Grating design;    Interference lithography;    Laser beam combining;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/844/1/012028/pdf
DOI  :  10.1088/1742-6596/844/1/012028

来源: IOP

【 摘 要 】

We report the design, fabrication and testing of a highly efficient polarization fan-out grating for coherent beam combining working at 1550 nm. The grating design exploits the geometric-phase effect. Deep-UV interference lithography is used to fabricate the designed grating. Such a polarization fan-out grating demonstrates several advantages that are ideal for laser beam combining.