Characteristics of Replacement Lithography and Desorption on Various Metal Substrates

STM;Replacement Lithography;metal substrates

Williams, James Alfred ; Dr. Stefan Franzen, Committee Member,Dr. Edmond F. Bowden, Committee Member,Dr. Christopher B. Gorman, Committee Chair,Williams, James Alfred ; Dr. Stefan Franzen ; Committee Member ; Dr. Edmond F. Bowden ; Committee Member ; Dr. Christopher B. Gorman ; Committee Chair

University:North Carolina State University

关键词: STM;    Replacement Lithography;    metal substrates;   

Others  :  https://repository.lib.ncsu.edu/bitstream/handle/1840.16/425/etd.pdf?sequence=1&isAllowed=y

美国|英语

来源: null

【 摘 要 】

The development of molecular electronic systems relies on the investigation of metal/molecule interactions.A popular methodology to forming metal/molecule interfaces uses the formation of self-assembled monolayers (SAMs), SAMs are capable of forming consistent, well order single to multiple layers of molecules oriented with respect to surface characteristics.While a plethora of techniques exist for exploring this phenomenon the utilization of replacement lithography presents a systematic approach to investigating the formation and stability of SAMs on various substrates.However, in authenticating investigations using lithographic techniques, the employment of electrochemistry forms conclusions on desorption and adsorption characteristics of the SAMs.While contemplating the contribution posed by metal/molecule interactions the facilitation of comparative methodologies in rationalizing processes of altering the characteristics of the monolayers, provides a speculative vantage of future endeavors into the development of molecular electronics.