Application of layout and topology optimization using pattern gradation for the conceptual design of buildings

topology optmization;pattern gradation;material layout;high-rise buildings;pattern constraints

Stromberg, Lauren L. ; Paulino ; Glaucio H.

关键词: topology optmization;    pattern gradation;    material layout;    high-rise buildings;    pattern constraints;   

Others  :  https://www.ideals.illinois.edu/bitstream/handle/2142/16004/1_Stromberg_Lauren.pdf?sequence=2&isAllowed=y

美国|英语

来源: The Illinois Digital Environment for Access to Learning and Scholarship

【 摘 要 】

This work explores the use of manufacturing-type constraints, in particular pattern gradation and repetition, in the context of layout optimization. By placing constraints on the design domain in terms of number and size of repeating patterns along any direction, the conceptual design for buildings is facilitated. To substantiate the potential future applications of this work, examples within the context of high-rise building design are presented. Successful development of such ideas will lead to practical engineering solutions, especially during the building design process. Throughout this work, a continuous topology optimization formulation is utilized with compliance as the objective function and constraints on the pattern geometry. Examples are given to illustrate the ideas developed both in two-dimensional and three-dimensional building configurations.