Soft lithography - materials and applications to plasmonic sensing and surface-enhanced raman scattering

Soft lithography;plasmonic crystals;Surface enhanced Raman spectroscopy (SERS);Raman scattering;polydimethylsiloxane;surface plasmon

Truong, Tu T.

关键词: Soft lithography;    plasmonic crystals;    Surface enhanced Raman spectroscopy (SERS);    Raman scattering;    polydimethylsiloxane;    surface plasmon;   

Others  :  https://www.ideals.illinois.edu/bitstream/handle/2142/15547/Truong_Tu.pdf?sequence=1&isAllowed=y

美国|英语

来源: The Illinois Digital Environment for Access to Learning and Scholarship

【 摘 要 】

The interest of unconventional techniques for nanofabrication has grown exponentially in recent years due to demanding equirements in micro/nanoscale structuresfor photonics, microfluidics, biotechnology, and flexible electronics. Soft lithographicmethods use elastomeric stamps, molds and conformable photomasks as patterning elements to provide capabilities that are unavailable with conventional techniques:patterning at molecular scale resolution (~1 nm); ability to form three-dimensional (3D) structure directly, in a single step; experimental simplicity and applicability to large areas. This dissertation explores new materials for the soft molds in order to enhance the resolution and application of soft lithographic methods. A commercially available perfluoropolyethylene (a-PFPE) and a synthesized material based on poly[(3-mercaptopropyl) methylsiloxane] (PMMS) are used in a variety of soft lithographic techniques for highfidelity and high resolution patterning. As an application example, I describe a class of quasi-3D plasmonic crystals for biosensing as well as surface-enhanced Raman scattering, with the connection to theoreticalresults obtained from rigorous electrodynamics simulations.