Novel Organosilicone Materials and Patterning Techniques for Nanoimprint Lithography.

Imprint Lithography;Silsesquioxane;Resist;Nanotechnology;Patterning;Silicone Resins;Materials Science and Engineering;Engineering;Macromolecular Science & Engineering

Pina, Carlos AlbertoPang, Stella W. ;

University of Michigan

关键词: Imprint Lithography;    Silsesquioxane;    Resist;    Nanotechnology;    Patterning;    Silicone Resins;    Materials Science and Engineering;    Engineering;    Macromolecular Science & Engineering;   

Others  :  https://deepblue.lib.umich.edu/bitstream/handle/2027.42/64783/pinac_1.pdf?sequence=1&isAllowed=y

瑞士|英语

来源: The Illinois Digital Environment for Access to Learning and Scholarship

【 摘 要 】

Nanoimprint Lithography (NIL) is a high-throughput patterning technique that allows the fabrication of nanostructures with great precision. It has been listed on the International Technology Roadmap for Semiconductors (ITRS) as a candidate technology for future generation Si chip manufacturing. In nanoimprint Lithography a resist material, e.g. a thermoplastic polymer, is placed in contact with a mold and then mechanically deformed under an applied load to transfer the nano-features on the mold surface into the resist. The success of NIL relies heavily in the capability of fabricating nanostructures on different types of materials. Thus, a key factor for NIL implementation in industrial settings is the development of advanced materials suitable as the nanoimprint resist. This dissertation focuses on the engineering of new polymer materials suitable as NIL resist. A variety of silicone-based polymer precursors were synthesized and formulated for NIL applications. High throughput and high yield nanopatterning was successfully achieved. Furthermore, additional capabilities of the developed materials were explored for a range of NIL applications such as their use as flexible, UV-transparent stamps and silicon compatible etching layers. Finally, new strategies were investigated to expand the NIL potentiality. High throughput, non-residual layer imprinting was achieved with the newly developed resist materials. In addition, several strategies were designed for the precise control of nanoscale size patterned structures with multifunctional resist systems by post-imprinting modification of the pattern size. These developments provide NIL with a new set of tools for a variety of additional important applications.