Measuring the Plasma Density of a Ferroelectric Plasma Source in an Expanding Plasma.

Dunaevsky, A. ; Fisch, N. J.

Technical Information Center Oak Ridge Tennessee

关键词: Plasma density;    Ferroelectric materials;    Capacitance;    Ceramics;    Electron temperature;   

RP-ID  :  DE2004821515

学科分类：工程和技术（综合）

美国|英语

来源: National Technical Reports Library

【 摘 要 】

The initial density and electron temperature at the surface of a ferroelectric plasma source were deduced from floating probe measurements in an expanding plasma. The method exploits negative charging of the floating probe capacitance by fast flows before the expanding plasma reaches the probe. The temporal profiles of the plasma density can be obtained from the voltage traces of the discharge of the charged probe capacitance by the ion current from the expanding plasma. The temporal profiles of the plasma density, at two different distances from the surface of the ferroelectric plasma source, could be further fitted by using the density profiles for the expanding plasma. This gives the initial values of the plasma density and electron temperature at the surface.