At-Wavelength Characterization of the EUV Engineering Test Stand Set-2 Optic.

Naulleau, P. ; Goldberg, K. A. ; Anderson, E. H. ; Batson, P.

Technical Information Center Oak Ridge Tennessee

关键词: Optical Systems;    Interferometry;    Ultraviolet optics;    Lithography;    Performance tests;   

RP-ID  :  DE2004795448

学科分类：工程和技术（综合）

美国|英语

来源: National Technical Reports Library

【 摘 要 】

At-wavelength interferometric characterization of a new 4 -reduction lithographicquality extreme ultraviolet (EUV) optical system is described. This state-of-the-art projection optic was fabricated for installation in the EUV lithography Engineering Test Stand (ETS) and is referred to as the ETS Set-2 optic. EUV characterization of the Set-2 optic is performed using the EUV phase-shifting point diffraction interferometer (PS/PDI) installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. This is the same interferometer previously used for the at-wavelength characterization and alignment of the ETS Set-1 optic.