| THIN SOLID FILMS | 卷:518 |
| Nitridation and contrast of B4C/La interfaces and X-ray multilayer optics | |
| Article | |
| Tsarfati, T.1  van de Kruijs, R. W. E.1  Zoethout, E.1  Louis, E.1  Bijkerk, F.1,2  | |
| [1] FOM Inst Plasma Phys Rijnhuizen, Nieuwegein, Netherlands | |
| [2] Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands | |
| 关键词: Multilayer; Lithography; X-FEL; GIXR; TEM; XPS; | |
| DOI : 10.1016/j.tsf.2010.04.088 | |
| 来源: Elsevier | |
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【 摘 要 】
Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influence in nanoscopic devices such as nano-electronics, magneto-optical storage and multilayer X-ray optics. We show that with the nitridation of reactive B4C/La interfaces, both the chemical and optical contrast can be greatly enhanced. Although interaction and diffusion of N-2 from the substrate towards the adlayer does occur, this surfactant mediated growth contributes to chemical and optical interface properties that enable major reflectivity improvements of multilayer optics for 6.7<7.0 nm. (C) 2010 Elsevier B.V. All rights reserved.
【 授权许可】
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【 预 览 】
| Files | Size | Format | View |
|---|---|---|---|
| 10_1016_j_tsf_2010_04_088.pdf | 465KB |
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