Orthoclase surface structure dissolution measured in situ by x-ray reflectivity and atomic force microscopy.

Sturchio, N. C. ; Fenter, P. ; Cheng, L. ; Teng, H.

Technical Information Center Oak Ridge Tennessee

关键词: Atomic force microscopy;    Dissolution;    Monocrystals;    Surface properties;    Feldspars;   

RP-ID  :  DE2001768634

学科分类：工程和技术（综合）

美国|英语

来源: National Technical Reports Library

【 摘 要 】

Orthoclase (001) surface topography and interface structure were measured during dissolution by using in situ atomic force microscopy (AFM) and synchrotrons X-ray reflectivity at pH 1.1-12.9 and T = 25-84 C. Terrace roughening at low pH and step motion at high pH were the main phenomena observed, and dissolution rates were measured precisely. Contrasting dissolution mechanisms are inferred for low- and high-pH conditions. These observations clarify differences in alkali feldspar dissolution mechanisms as a function of pH, demonstrate a new in situ method for measuring face-specific dissolution rates on single crystals, and improve the fundamental basis for understanding alkali feldspar weathering processes.