Conveyorized Photoresist Stripping Replacement for Flex Circuit Fabrication

Donahue, Megan

Kansas City Plant (KCP), Kansas City, MO

关键词: Removal;    Microelectronic Circuits;    42 Engineering;    Masking;    Fabrication;   

DOI  :  10.2172/952451
RP-ID  :  KCP-613-8239
RP-ID  :  DE-AC04-01AL66850
RP-ID  :  952451

美国|英语

来源: UNT Digital Library

【 摘 要 】

A replacement conveyorized photoresist stripping system was characterized to replace the ASI photoresist stripping system. This system uses the qualified ADF-25c chemistry for the fabrication of flex circuits, while the ASI uses the qualified potassium hydroxide chemistry. The stripping process removes photoresist, which is used to protect the copper traces being formed during the etch process.