Plasma Processing of Advanced Materials

Heberlein, Joachim, V.R. ; Pfender, Emil ; Kortshagen, Uwe

University of Minnesota, Minneapolis, MN

关键词: Glow Discharges;    Thomson Scattering Plasma Processing, Materials, Superhardness, Diagnostics, Nanotubes;    Atmospheric Pressure;    Processing;    Plasma Processing, Materials, Superhardness, Diagnostics, Nanotubes;   

DOI  :  10.2172/850406
RP-ID  :  DOE/ER/13433
RP-ID  :  FG02-85ER13433
RP-ID  :  850406

美国|英语

来源: UNT Digital Library

【 摘 要 】

Plasma Processing of Advanced Materials The project had the overall objective of improving our understanding of the influences of process parameters on the properties of advanced superhard materials. The focus was on high rate deposition processes using thermal plasmas and atmospheric pressure glow discharges, and the emphasis on superhard materials was chosen because of the potential impact of such materials on industrial energy use and on the environment. In addition, the development of suitable diagnostic techniques was pursued. The project was divided into four tasks: (1) Deposition of superhard boron containing films using a supersonic plasma jet reactor (SPJR), and the characterization of the deposition process. (2) Deposition of superhard nanocomposite films in the silicon-nitrogen-carbon system using the triple torch plasma reactor (TTPR), and the characterization of the deposition process. (3) Deposition of films consisting of carbon nanotubes using an atmospheric pressure glow discharge reactor. (4) Adapting the Thomson scattering method for characterization of atmospheric pressure non-uniform plasmas with steep spatial gradients and temporal fluctuations. This report summarizes the results.