Infrared Frequency Selective Surfaces Fabricated using Optical Lithography and Phase-Shift Masks

Spector, S.J. ; Astolfi, D.K. ; Doran, S.P. ; Lyszczarz, T.M. ; Raynolds, J.E.

Lockheed Martin

关键词: 42 Engineering;    Fabrication;    Wavelengths;    Phase Shift;   

DOI  :  10.2172/821683
RP-ID  :  LM-01K062
RP-ID  :  AC12-00SN39357
RP-ID  :  821683

美国|英语

来源: UNT Digital Library

【 摘 要 】

A frequency selective surface (FSS) structure has been fabricated for use in a thermophotovoltaic system. The FSS provides a means for reflecting the unusable light below the bandgap of the thermophotovoltaic cell while transmitting the usable light above the bandgap. This behavior is relatively independent of the light's incident angle. The fabrication of the FSS was done using optical lithography and a phase-shift mask. The FSS cell consisted of circular slits spaced by 1100 nm. The diameters and widths of the circular slits were 870 nm and 120 nm, respectively. The FSS was predicted to pass wavelengths near 7 {micro}m and reflect wavelengths outside of this pass-band. The FSSs fabricated performed as expected with a pass-band centered near 5 {micro}m.