Developing multi-layer mirror technology near 45 nm using Sc/Si interfaces

Nilsen, J ; Jankowski, A ; Friedman, L ; Walton, C C

Lawrence Livermore National Laboratory

关键词: Wavelengths;    Mirrors;    36 Materials Science;    Reflectivity;    42 Engineering;   

DOI  :  10.2172/15009781
RP-ID  :  UCRL-TR-202362
RP-ID  :  W-7405-ENG-48
RP-ID  :  15009781

美国|英语

来源: UNT Digital Library

【 摘 要 】

Given the existing X-ray laser sources near 45 nm it would be useful to produce efficient X-ray optics in the 35 to 50 nm wavelength range that could be utilized in new applications. In this work we are developing the process to stabilize the interfaces of nanolaminate structures using materials such as Sc and Si. These materials will enable us to develop new multi-layer mirror technology that can be used in the wavelength range near 45 nm. To obtain this objective, the interfacial structure and reaction kinetics must first be well understood and then controlled for design applications. In this work we fabricate several Sc/Si multi-layer mirrors with and without a B{sub 4}C barrier layer. The structure and reflectivity of the mirrors are analyzed.