Baseline Design Compliance Matrix for the Type 4 In Situ Vapor Samplers (ISVS)

Boger, R. M.

CH2M Hill Hanford Group, Inc.

关键词: Management;    Compliance;    Radioactive Wastes;    Sampling;    Wastes;   

DOI  :  10.2172/801133
RP-ID  :  RPP-5275, Rev.0
RP-ID  :  AC27-99RL14047
RP-ID  :  801133

美国|英语

来源: UNT Digital Library

【 摘 要 】

The DOE has identified a need to sample vapor space and exhaust ducts in waste tanks that store radioactive waste. This document provides the Design Compliance Matrix (DCM) for the Type 4 In-Situ Vapor Sampling (ISVS) system that is used for completing this sampling function. The DCM identifies the design requirements and the source of the requirements for the Type 4 ISVS system. DCMs are a single-source compilation design requirements for sampling and sampling support equipment and support the configuration management of these systems.