Development of Thin Film Silicon Solar Cell Using Inkjet Printed Silicon and Other Inkjet Processes: Cooperative Research and Development Final Report, CRADA Number CRD-07-260

Sopori, B.

关键词: CHEMICAL VAPOR DEPOSITION;    EVAPORATION;    GLASS;    PLASMA;    POLYMERIZATION;    SILICON;    SILICON SOLAR CELLS;    SOLAR CELLS;    SPUTTERING;    SUBSTRATES;    THIN FILMS CRADA;    Solar Energy - Photovoltaics;   

DOI  :  10.2172/1043746
RP-ID  :  NREL/TP-7A10-53846
PID  :  OSTI ID: 1043746
Others  :  TRN: US201214%%168

美国|英语

来源: SciTech Connect

【 摘 要 】

The cost of silicon photovoltaics (Si-PV) can be greatly lowered by developing thin-film crystalline Si solar cells on glass or an equally lower cost substrate. Typically, Si film is deposited by thermal evaporation, plasma enhanced chemical vapor deposition, and sputtering. NREL and Silexos have worked under a CRADA to develop technology to make very low cost solar cells using liquid organic precursors. Typically, cyclopentasilane (CPS) is deposited on a glass substrate and then converted into an a-Si film by UV polymerization followed by low-temperature optical process that crystallizes the amorphous layer. This technique promises to be a very low cost approach for making a Si film.