Student Support for EIPBN 2014 Conference - Final Report

Farrow, Reginald C.

关键词: Nanofabrication;    Lithograpy;   

DOI  :  10.2172/1156814
RP-ID  :  DOE-NJIT-0011789-1
PID  :  OSTI ID: 1156814

美国|英语

来源: SciTech Connect

【 摘 要 】

The 58th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), 2014, was held at the Omni Shoreham Hotel in Washington, DC, May 27 to 30, 2014. The EIPBN Conference is recognized as the foremost international meeting dedicated to lithographic science and technology and its application to micro and nanofabrication techniques. The conference brought together 386 engineers and scientists from industries and universities from all over the world to discuss recent progress and future trends. Among the emerging technologies that are within the scope of EIPBN is Nanofabrication for Energy Sources along with nanofabrication for the realization of low power integrated circuits. Every year, EIPBN provides financial support for students to attend the conference. Travel support for 43 students came from a mixture of government agencies and corporate donors. The Department of Energy Office of Basic Energy Sciences provided $5,000 to support student travel from US universities to participate at EIPBN 2014 through grant DE-SC0011789.