Fabrication of L10-FeNi phase by sputtering with rapid thermal annealing

JOURNAL OF ALLOYS AND COMPOUNDS

卷:750

Article

Tashiro, Takayuki¹  Mizuguchi, Masaki¹  Kojima, Takayuki¹  Koganezawa, Tomoyuki²  Kotsugi, Masato²  Ohtsuki, Takumi²  Sato, Kazuhisa¹  Konno, Toyohiko¹  Takanashi, Koki¹ 

[1] Tohoku Univ, Inst Mat Res, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan

[2] Japan Synchrotron Radiat Res Inst JASRI SPring8, 1-1-1 Koto, Sayo, Hyogo 6795198, Japan

关键词: L1(0)-FeNi;    Ordered alloys;    Magnetic materials;    Magnetic anisotropy;    Sputtering;   

DOI  :  10.1016/j.jallcom.2018.02.318

来源: Elsevier

【 摘 要 】

FeNi films were directly deposited on MgO(001) substrates by co-sputtering and rapid thermal annealing (RTA). The formation of the L1(0) phase was investigated for films with different thicknesses and different annealing conditions by grazing incidence X-ray diffraction. For the FeNi films with a thickness of 5 nm, superlattice 001 and 110 peaks were observed after annealing at a heating rate of 50 degrees C/s, which indicates that three variants of L1(0) grains were formed in the films. The maximum long-range order parameter, which corresponded to a volume-averaged parameter, was approximately 0.11. For the FeNi films with a thickness of 30 nm, a superlattice 110 peak was only observed after annealing at a heating rate of 50 degrees C/s, and the formation of 001 textured grains was clarified. Magnetic properties also changed depending on the FeNi film structures. The formation mechanism of L1(0)-FeNi is discussed based on the strain caused by RTA in the FeNi films. (C) 2018 Elsevier B.V. All rights reserved.

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