Properties of atomic layer deposited iron oxide and bismuth oxide chloride structures

JOURNAL OF ALLOYS AND COMPOUNDS

卷:846

Article

Seemen, Helina¹  Kukli, Kaupo¹  Jogiaas, Taivo¹  Ritslaid, Peeter¹  Link, Joosep²  Stern, Raivo²  Duenas, Salvador³  Castan, Helena³  Tamm, Aile¹ 

[1] Univ Tartu, Inst Phys, W Ostwaldi 1, EE-50411 Tartu, Estonia

[2] NICPB, Akadeemia Tee 23, EE-12618 Tallinn, Estonia

[3] Univ Valladolid, Dept Elect, Paseo Belen 15, Valladolid 47011, Spain

关键词: Atomic layer deposition;    epsilon-Fe2O3;    BiOCl nanoflakes;    Visible illumination;    Thin films;    Nanostructured materials;    Vapor deposition;    Magnetization;    Magnetic measurements;    Scanning electron microscopy (SEM);    X-ray diffraction;   

DOI  :  10.1016/j.jallcom.2020.156099

来源: Elsevier

【 摘 要 】

Two-component crystalline thin film structures consisting of continuous epsilon-Fe2O3 bottom layers followed by top layers of BiOCl nanoflakes were grown using atomic layer deposition from FeCl3 and BiCl3 at 375 degrees C. Si(100) planar wafer, three-dimensional Si structures and conductive TiN/Si were exploited as substrates. Electrical measurements revealed that the deposited structures were moderately leaky, as the structures showed rectifying behavior affected by visible illumination. Magnetization in these films in the as-deposited state was nonlinear, saturative, and exhibited well-defined coercive fields. Annealing changed the surface morphology, phase composition and reduced the magnetic behavior of the thin films. (C) 2020 The Authors. Published by Elsevier B.V.

【 授权许可】

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