Construction of parameterizations of masks for tight wavelet frames with two symmetric/antisymmetric generators and applications in image compression and denoising

JOURNAL OF COMPUTATIONAL AND APPLIED MATHEMATICS

卷:235

Article

Yang, Xiaoyuan¹  Shi, Yan¹  Zhou, Wanlu¹ 

[1] Beihang Univ, Sch Math & Syst Sci, LMIB, Minist Educ, Beijing 100191, Peoples R China

关键词: Tight wavelet frame;    Parameterizations of masks;    Image compression;    Optimal FIR filters;    CLHMM;    Denoising algorithm;   

DOI  :  10.1016/j.cam.2010.10.009

来源: Elsevier

【 摘 要 】

In this paper, we present a general construction framework of parameterizations of masks for tight wavelet frames with two symmetric/antisymmetric generators which are of arbitrary lengths and centers. Based on this idea, we establish the explicit formulas of masks of tight wavelet frames. Additionally, we explore the transform applicability of tight wavelet frames in image compression and denoising. We bring forward an optimal model of masks of tight wavelet frames aiming at image compression with more efficiency, which can be obtained through SQP (Sequential Quadratic Programming) and a GA (Genetic Algorithm). Meanwhile, we present a new model called Cross-Local Contextual Hidden Markov Model (CLCHMM), which can effectively characterize the intrascale and cross-orientation correlations of the coefficients in the wavelet frame domain, and do research into the corresponding algorithm. Using the presented CLCHMM, we propose a new image denoising algorithm which has better performance as proved by the experiments. (C) 2010 Elsevier B.V. All rights reserved.

【 授权许可】

Free