Structural effects in UO2 thin films irradiated with fission- energy Xe ions

JOURNAL OF NUCLEAR MATERIALS

卷:482

Article

Popel, A. J.¹  Lebedev, V. A.²  Martin, P. G.³  Shiryaev, A. A.^2,4  Lampronti, G. I.¹  Springell, R.³  Kalmykov, S. N.^2,5  Scott, T. B.³  Monnet, I.⁶  Grygiel, C.⁶  Farnan, I.¹ 

[1] Univ Cambridge, Dept Earth Sci, Downing St, Cambridge CB2 3EQ, England

[2] Lomonosov Moscow State Univ, Moscow 119991, Russia

[3] Univ Bristol, Interface Anal Ctr, Sch Phys, Bristol BS8 1TL, Avon, England

[4] RAS, Frumkin Inst Phys Chem & Electrochem, Moscow, Russia

[5] Kurchatov Inst, Natl Res Ctr, Moscow 123098, Russia

[6] Univ Caen, CIMAP, CEA CNRS ENSICAEN, BP 5133, F-14070 Caen 5, France

关键词: UO2;    Ion irradiation;    Microstructure;    Thin films;    Radiation damage;   

DOI  :  10.1016/j.jnucmat.2016.10.024

来源: Elsevier

【 摘 要 】

Uranium dioxide thin films have been successfully grown on LSAT (Al10La3O51Sr14Ta7) substrates by reactive magnetron sputtering. Irradiation by 92 MeV Xe-129(23+) ions to simulate fission damage that occurs within nuclear fuels caused microstructural and crystallographic changes. Initially flat and continuous thin films were produced by magnetron sputtering with a root mean square roughness of 0.35 nm determined by AFM. After irradiation, this roughness increased to 60-70 nm, with the films developing discrete microstructural features: small grains (similar to 3 mu m), along with larger circular (up to 40 mm) and linear formations with non-uniform composition according to the SEM, AFM and EDX results. The irradiation caused significant restructuring of the UO2 films that was manifested in significant film-substrate mixing, observed through EDX analysis. Diffusion of Al from the substrate into the film in unirradiated samples was also observed. (C) 2016 The Authors. Published by Elsevier B.V.

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