Nanoindentation study of the combined effects of crystallography, heat treatment and exposure to high-flux deuterium plasma in tungsten

JOURNAL OF NUCLEAR MATERIALS

卷:486

Article

Zayachuk, Y.^1,2  Armstrong, D. E. J.¹  Bystrov, K.³  Van Boxel, S.²  Morgan, T.³  Roberts, S. G.^1,2 

[1] Univ Oxford, Dept Mat, Parks Rd, Oxford OX1 3PH, England

[2] Culham Sci Ctr, Culham Ctr Fus Energy, Abingdon 0X14 3DB, Oxon, England

[3] Trilateral Euregio Cluster, FOM Inst DIFFER, Dutch Inst Fundamental Energy Res, Zaale 20, NL-3612 AJ Eindhoven, Netherlands

关键词: Nanoindentation;    EBSD;    Tungsten;    Annealing;    Deuterium plasma;   

DOI  :  10.1016/j.jnucmat.2017.01.026

来源: Elsevier

【 摘 要 】

tungsten samples were heat-treated to achieve partial recrystallization and exposed to high ion flux deuterium plasma at different temperatures and fluences. Continuous stiffness nanoindentation measurements of near-surface hardness were performed in the grains of specific annealing states and of specific crystallographic orientation, determined by electron backscatter diffraction (EBSD); indentation pile-up was investigated using surface profilometry. Bulk hardness of unexposed tungsten does not strongly depend on grain orientation, but depends on the annealing state of the grain, with values between similar to 4.3 GPa for recrystallized grains and similar to 5.5 for non-recrystallized ones. Grains with < 111 > surface normal orientation feature the least pile-up, while grains with < 001 > orientation the most; pile-up also depends on the annealing state, being generally lower in recrystallized grains. Plasma exposure leads to the increase of hardness, most significantly near the surface. The width of plasma-affected zone increases with the increase of exposure temperature and fluence, as well in recrystallized grains, correlating with the increase of diffusion depth. Plasma exposure does not lead to the emergence of orientation dependence of hardness. Both indentation pile-up and near-surface indentation pop-ins are generally suppressed by plasma exposure. (C) 2017 Elsevier B.V. All rights reserved.

【 授权许可】

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