Enhancement of magnetostrictive properties of Galfenol thin films

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS

卷:451

Article

Nivedita, Lalitha Raveendran¹  Manivel, Palanisamy²  Pandian, Ramanathaswamy³  Murugesan, S.⁴  Morley, Nicola Ann⁵  Asokan, K.⁶  Kumar, Ramasamy Thangavelu Rajendra^1,7 

[1] Bharathiar Univ, Dept Phys, AMDL, Coimbatore 641046, Tamil Nadu, India

[2] Bharathidasan Univ, Sch Phys, Ctr Nanosci & Nanotechnol, Tiruchirappalli 620024, Tamil Nadu, India

[3] Indira Gandhi Ctr Atom Res, Mat Sci Grp, Kalpakkam 603102, Tamil Nadu, India

[4] Indira Gandhi Ctr Atom Res, Mat Synth & Struct Characterizat Div, PMG, MMG, Kalpakkam 603102, Tamil Nadu, India

[5] Univ Sheffield, Dept Mat Sci & Engn, Sheffield S1 3JD, S Yorkshire, England

[6] Inter Univ Accelerator Ctr, Mat Sci Div, New Delhi 110067, India

[7] Bharathiar Univ, Dept Nanosci & Technol, Coimbatore 641046, Tamil Nadu, India

关键词: FeGa;    Magnetostriction;    Magnetic anisotropy;    Sputtering;    Magnetic thin films;   

DOI  :  10.1016/j.jmmm.2017.11.030

来源: Elsevier

【 摘 要 】

The present study investigates the role of substrate temperatures on the structural, morphological, magnetic and magnetostrictive properties of DC sputtered FeGa thin films grown on Si substrates. These films were deposited at various substrate temperatures between 50 and 350 degrees C. The structural characterization of the films revealed columnar growth and the transformation of surface morphology from prismatic to spherical at high substrate temperatures. Both L1(2) and B2 phases of FeGa existed in the films, with the L1(2) phase dominating. The in-plane and out-of-plane vibration sample magnetometry measurements showed the evolution of magnetic anisotropy in these films. It was revealed from the magnetostriction measurements that the films deposited at 250 degrees C exhibited the maximum value of 59 ppm. (C) 2017 Elsevier B.V. All rights reserved.

【 授权许可】

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