Silicon substrate orientation influence on structural and magnetic properties of BaFe12O19 thin films obtained by RF magneton sputtering

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS

卷:504

Article

Rossi, Vinicius Pretti¹  Bonini, Ricardo Pereira¹  Goncalves, Andre Marino¹  Gualdi, Alexandre Jose¹  Eiras, Jose Antonio¹  Zabotto, Fabio Luis¹ 

[1] Univ Fed Sao Carlos, Phys Dept, Sao Carlos, SP, Brazil

关键词: Thin films;    Magnetoelectric composites;    RF sputtering;    Barium hexaferrite;    In-plane orientation;   

DOI  :  10.1016/j.jmmm.2020.166705

来源: Elsevier

【 摘 要 】

In this work, the fabrication of BaFe12O19 (BaM) thin films by radio-frequency sputtering and the influence of substrate orientation on structural, microstructure and magnetic properties were carried out. Measurements pointed out the deposition time and power have no significant effect over stoichiometry in the studied condition, producing films with satisfying Fe:Ba rate confirmed by EDX analysis. The orientation of the Si substrate showed to be essentially correlated with in-plane orientation of BaM phase. Both Si (1 0 0) and (1 1 1) substrates privileged in-plane orientation of the c-axis of BaM and atomic force microscopy found needle-like grains spread randomly onto substrates, although Si (1 1 1) substrate exhibited higher magnetic anisotropy.

【 授权许可】

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