Effect of applied magnetic field on the electroplating and magnetic properties of amorphous FeNiPGd thin film

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS

卷:495

Article

Yang, Lin-Lin^1,2  Chen, Chunhuan¹  Yuan, Jie²  Gao, Li-Yin^2,4  Shang, Zhengang³  Liu, Zhi-Quan^2,4 

[1] Dalian Jiaotong Univ, Sch Mat Sci & Engn, Dalian 116024, Peoples R China

[2] Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China

[3] Cent South Univ, Adv Res Ctr, Changsha 410083, Hunan, Peoples R China

[4] Chinese Acad Sci, Shenzhen Inst Adv Elect Mat, Shenzhen Inst Adv Technol, Shenzhen 518055, Peoples R China

关键词: FeNiPGd thin film;    Electroplating;    External magnetic field;    In-plane anisotropy;    Dynamic permeability;   

DOI  :  10.1016/j.jmmm.2019.165872

来源: Elsevier

【 摘 要 】

Uniaxial magnetic anisotropy has been induced in multi-element soft magnetic amorphous FeNiPGd thin films, which were fabricated by electroplating with an external magnetic field applied parallel to the plane of the electrode. After the application of the magnetic field, surface morphology of the FeNiPGd layer is improved. The crystal grains are refined, and the number of pores generated on the surface is remarkably reduced. The introduction of external magnetic field can significantly improve the deposition rate and dynamic permeability. And the cutoff frequency can achieve 500 MHz when the applied magnetic field is 40 mT during the deposition process. Specifically, the in-plane anisotropy field of the film was calculated by the area integral method to be approximately 116Oe while the magnetic field is 10 mT, which is obviously higher than that of the binary FeNi material.

【 授权许可】

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