Epitaxial growth of Fe on Mo(110) studied by scanning tunneling microscopy

SURFACE SCIENCE

卷:414

Article

Malzbender, J ; Przybylski, M ; Giergiel, J ; Kirschner, J

关键词: epitaxy;    nucleation;    scanning tunneling microscopy;    surface diffusion;    surface stress;    wetting;   

DOI  :  10.1016/S0039-6028(98)00511-1

来源: Elsevier

【 摘 要 】

Scanning tunneling microscopy has been used to investigate the growth of Ft: on Mo(110). Growth was carried our at room temperature with growth rates between 0.03 and 0.5 ML min(-1). Initially, the first atomic layer is completed independently of the rate of evaporation. At low deposition rates the further growth proceeds in a multi-layer fashion whereas at higher rates the layer growth is partially preserved. Preferred growth along the [001] direction is observed in some cases. One-dimensional dislocation lines are observed in the second-layer islands. At higher coverage a two-dimensional dislocation network occurs which vanishes for thicker films. Ar a temperature of 600 K Fe on Mo(110) grows by a step flow mechanism in the first layer followed by the formation of wedge-shaped three-dimensional islands. A comparison with Fe grown on W(110) at a similar deposition rate is provided. (C) 1998 Elsevier Science B.V. All rights reserved.

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