Reversible photon-induced oxidation of graphene by NO2 adsorption

SURFACE SCIENCE

卷:621

Article

Boettcher, Stefan¹  Vita, Hendrik¹  Horn, Karsten¹ 

[1] Max Planck Gesell, Fritz Haber Inst, Faradayweg 4-6, D-14195 Berlin, Germany

关键词: Graphene;    Graphene Oxide;    Functionalization;    NEXAFS;    XPS;    Adsorbates;   

DOI  :  10.1016/j.susc.2013.11.010

来源: Elsevier

【 摘 要 】

We show that an oxidized graphene sheet is formed by NO2 adsorption and subsequent photodissociation, through an analysis of X-ray absorption and photoemission spectroscopic results. Adsorption of NO2 on graphene grown on Ir(111) leads to a strong rehybridization of the unoccupied pi* states and the appearance of new features in the C 1s core level line. This is a reversible process, such that pristine graphene can be recovered by thermal treatment. The formation of oxidized graphene is sensitive to the photon-flux, resulting in an intermediate phase of oxidized graphene. Our results provide an interesting pathway towards lithographic patterning processes in graphene. (C) 2013 Elsevier B.V. All rights reserved.

【 授权许可】

Free