Ion beam effects of 26.0 MeV Cu7+ ions in thin metallic and insulating films during Heavy Ion ERDA measurements

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:349

Article

Mavhungu, H.^1,4  Msimanga, M.^2,3  Hlatshwayo, T.⁴ 

[1] NECSA, Div Radiat Sci, PLABS, ZA-0001 Pretoria, South Africa

[2] Tshwane Univ Technol, Dept Phys, ZA-0001 Pretoria, South Africa

[3] Natl Res Fdn, iThemba LABS, ZA-2050 Johannesburg, South Africa

[4] Univ Pretoria, Dept Phys, ZA-0028 Pretoria, South Africa

关键词: Thin film;    Heavy Ion ERDA;    Ion beam damage;    Electronic sputtering;    Ion beam analysis;   

DOI  :  10.1016/j.nimb.2015.02.047

来源: Elsevier

【 摘 要 】

We report on an investigation carried out to determine effects of the probing beam on the structure of typical metallic and insulating thin films during Elastic Recoil Detection Analysis (ERDA) using a heavy ion beam. Metallic niobium nitride (NbN) and insulating calcium fluoride (CaF2) thin films (used as test samples) were irradiated by 26.0 MeV Cu-63(7+) ions to fluences of 1.70 x 10(14) ions/cm(2) and 2.70 x 10(14) ions/cm(2), respectively. The effects of irradiation on the structural properties of the films were studied using Rutherford Backscattering Spectrometry (RBS), X-ray diffraction (XRD) and Atomic Force Microscopy (AFM). RBS results showed a significant (18%) reduction in the thickness of the CaF2 film due to electronic sputtering compared to only 1% reduction in the NbN film. XRD results showed no significant peak shifts in both films, but rather formation of unidentified peaks in the insulating film. AFM results indicated a substantial decrease in the average surface roughness of the insulating film and only a nominal increase in that of the metallic film. Results of electronic sputtering yield measurements carried out by ERDA are explained in terms of both the Coulomb explosion and the inelastic thermal spike models. (C) 2015 Elsevier B.V. All rights reserved.

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