Operational limit of a planar DC magnetron cluster source due to target erosion

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:316

Article

Rai, A.¹  Mutzke, A.²  Bandelow, G.²  Schneider, R.³  Ganeva, M.³  Pipa, A. V.⁴  Hippler, R.³ 

[1] Univ Erlangen Nurnberg, Inst Sci & Technol Met, D-91058 Erlangen, Germany

[2] EURATOM, Max Planck Inst Plasmaphys, D-17491 Greifswald, Germany

[3] Ernst Moritz Arndt Univ Greifswald, Inst Phys, D-17489 Greifswald, Germany

[4] Leibniz Inst Plasma Sci & Technol INP Greifswald, D-17489 Greifswald, Germany

关键词: SDTrimSP;    Sputtering;    Magnetron;   

DOI  :  10.1016/j.nimb.2013.08.027

来源: Elsevier

【 摘 要 】

The binary collision-based two dimensional SDTrimSP-2D model has been used to simulate the erosion process of a Cu target and its influence on the operational limit of a planar DC magnetron nanocluster source. The density of free metal atoms in the aggregation region influences the cluster formation and cluster intensity during the target lifetime. The density of the free metal atoms in the aggregation region can only be predicted by taking into account (i) the angular distribution of the sputtered flux from the primary target source and (ii) relative downwards shift of the primary source of sputtered atoms during the erosion process. It is shown that the flux of the sputtered atoms smoothly decreases with the target erosion. (C) 2013 Elsevier B.V. All rights reserved.

【 授权许可】

Free