Holmium and titanium oxide nanolaminates by atomic layer deposition

THIN SOLID FILMS

卷:565

Article

Kukli, Kaupo^1,4  Lu, Jun²  Link, Joosep³  Kemell, Marianna¹  Puukilainen, Esa¹  Heikkila, Mikko¹  Hoxha, Roland⁴  Tamm, Aile⁴  Hultman, Lars²  Stern, Raivo³  Ritala, Mikko¹  Leskela, Markku¹ 

[1] Univ Helsinki, Dept Chem, FI-00014 Helsinki, Finland

[2] Linkoping Univ, Dept Phys Chem & Biol IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden

[3] NICPB, EE-126186 Tallinn, Estonia

[4] Univ Tartu, Inst Phys, Dept Mat Sci, EE-50411 Tartu, Estonia

关键词: Atomic layer deposition;    Holmium oxide;    Titanium oxide;    Holmium titanate;    Multilayer;    Nanolaminate;    Magnetic materials;   

DOI  :  10.1016/j.tsf.2014.06.039

来源: Elsevier

【 摘 要 】

Nanolaminate (nanomultilayer) thin films of TiO2 and Ho2O3 were grown on Si(001) substrates by atomic layer deposition at 300 degrees C from alkoxide and beta-diketonate based metal precursors and ozone. Individual layer thicknesses were 2 nm for TiO2 and 4.5 nm for Ho2O3. As-deposited films were smooth and X-ray amorphous. After annealing at 800 degrees C and higher temperatures the nanolaminate structure was destroyed by solid-state reaction to form Ho2Ti2O7. The films demonstrated diamagnetic or paramagnetic behaviour in the as-deposited state. After annealing, the films possessed net magnetic moment, allowing one to record saturation magnetization and weak coercivity. (C) 2014 Elsevier B.V. All rights reserved.

【 授权许可】

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