Corrosion resistance of Al and Al-Mn thin films

THIN SOLID FILMS

卷:615

Article

Mraied, Hesham¹  Cai, Wenjun¹  Sagues, Alberto A.² 

[1] Univ S Florida, Dept Mech Engn, 4202 E Fowler Ave, Tampa, FL 33620 USA

[2] Univ S Florida, Dept Civil & Environm Engn, 4202 E Fowler Ave, Tampa, FL 33620 USA

关键词: Alloy;    Aluminum;    Microstructure;    Polarization;    Passivity;    Pitting corrosion;   

DOI  :  10.1016/j.tsf.2016.07.057

来源: Elsevier

【 摘 要 】

Magnetron-sputtered aluminum (Al) and aluminum-manganese (Al-Mn) films with structures ranging from nanocrystalline to amorphous were obtained by tuning the Mn% up to 20.5 at.%. Corrosion behavior of the films was investigated in 0.6 M and 0.01 M NaCl aqueous solutions by potentiodynamic polarization and electrochemical impedance spectroscopy. Pitting corrosion was found to be strongly affected by alloy composition. The amorphous Al-20.5 at.% Mn exhibited the best pitting resistance during short term exposure. However, over longer immersion in 0.01 M NaCl up to 108 h, nanocrystalline Al-5.2 at.% Mn showed the highest corrosion resistance. The dual-phase Al-11.5 at.% Mn alloy was found to have higher nominal corrosion rate compared to its nanocrystalline or amorphous counterparts. (C) 2016 Elsevier B.V. All rights reserved.

【 授权许可】

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