Analysis of the damage effect of femtosecond-laser irradiation on extreme ultraviolet Mo/Si multilayer coating

THIN SOLID FILMS

卷:520

Article

Suman, M.¹  Monaco, G.^1,2  Zuppella, P.¹  Nicolosi, P.^1,2  Pelizzo, M. G.^1,2  Ferrari, F.^3,4  Lucchini, M.^3,4  Nisoli, M.^3,4 

[1] IFN CNR, Inst Photon & Nanotechnol, Natl Res Council, I-35131 Padua, Italy

[2] Univ Padua, Dept Informat Engn, I-35131 Padua, Italy

[3] Politecn Milan, Dept Phys, I-20133 Milan, Italy

[4] IFN CNR, Ist Foton & Nanotecnol, I-20133 Milan, Italy

关键词: Extreme UV lithography;    Multilayers;    Attosecond physics;    Laser damage;   

DOI  :  10.1016/j.tsf.2011.08.109

来源: Elsevier

【 摘 要 】

Damage analysis of Mo/Si multilayer coatings exposed to fs infrared laser irradiation has been performed. The Mo/Si a-periodic multilayer samples were specifically designed with wide reflectivity bandwidth and suitable phase chirp in order to reflect attosecond pulses. After irradiation, the mirror surface was analyzed by using an optical microscope and a profilometer. The stoichiometry of the compounds formed at the sample surface after the irradiation was investigated using X-Ray photoemission spectroscopy. The performances of the irradiated samples with the reflected pulse characteristics have been derived via reflectivity and phase measurements. (C) 2011 Elsevier B.V. All rights reserved.

【 授权许可】

Free