Toward the β-FeSi2 p-n homo-junction structure

THIN SOLID FILMS

卷:515

Article; Proceedings Paper

Momose, N. ; Shirai, J. ; Tahara, H. ; Todoroki, Y. ; Hara, T. ; Hashimoto, Y.

关键词: beta-FeSi2;    MOSi2;    glass substrate;    softening temperature;   

DOI  :  10.1016/j.tsf.2007.02.037

来源: Elsevier

【 摘 要 】

beta-FeSi2 thin films were prepared on various substrates, and the influence of the thermal expansion coefficient (TEC) and the softening temperature on the film quality were discussed. It was clarified that a crack-free beta-FeSi2 film could be formed on a glass material substrate with a TEC close to that of beta-FeSi2, and when the softening point of the substrate is close to the crystal growth temperature of beta-FeSi2. A (beta-FeSi2)/ (MoSi2)//(Corning 1737 glass) stacked structure without leak current was prepared to demonstrate the possibility of a MoSi2 back electrode layer. Furthermore, the (Al-doped p-beta-FeSi2)/(Ni-doped eta-beta-FeSi2) homo-junction was also prepared by the vacuum evaporation and thermal diffusion method. We have succeeded in achieving current-rectification to a beta-FeSi2 thin film, although the anode current was small. (c) 2007 Elsevier B.V. All rights reserved.

【 授权许可】

Free