Low pressure chemical vapour deposition of BN: Relationship between gas phase chemistry and coating microstructure

THIN SOLID FILMS

卷:664

Article

Carminati, P.¹  Buffeteau, T.²  Daugey, N.²  Chollon, G.¹  Rebillat, F.¹  Jacques, S.¹ 

[1] Univ Bordeaux, CNRS, CEA, LCTS,Safran Ceram,UMR 5801, 3 Allee Boetie, Pessac, France

[2] ISM, UMR 5255, Batiment A12,351 Cours Liberat, Talence, France

关键词: Boron nitride;    Boron trichloride;    Aminodichloroborane;    Dichloroborane;    Effective precursor;    Crystallization degree;    Structural homogeneity;    Fourier-transform infrared spectroscopy;   

DOI  :  10.1016/j.tsf.2018.08.020

来源: Elsevier

【 摘 要 】

The structural and morphological characteristics of flat BN coatings processed by chemical vapour deposition, using BCl3 - NH3 - H-2 gas mixtures at low pressure (P < 1 kPa), have been investigated as a function of the deposition temperature (ranging from 900 degrees C to 1400 degrees C) and the total gas flow rate. The resulting BN coatings are mainly turbostratic but with heterogeneous microstructures, i.e. mixtures of poorly and highly organized domains. The structural homogeneity and the degree of crystallization depend notably on the nature of the dilution gas (either H-2 or Ar) and the depletion of gas species. The decrease of the apparent activation energy from 80 kJ.ml( )(-1)below 1200 degrees C to 40 kJ.ml(-1) above 1200 degrees C reflects a change in the deposition regime. Ex situ Fourier transform infrared analysis of the residual gas mixture allowed intermediate species leading to poorly or highly organized BN to be tracked and then connected with the main reaction paths leading to the different BN coatings.

【 授权许可】

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