IR emission from the target during plasma magnetron sputter deposition

THIN SOLID FILMS

卷:545

Article

Cormier, P. -A.¹  Thomann, A. -L.¹  Dolique, V.²  Balhamri, A.^3,4  Dussart, R.¹  Semmar, N.¹  Lecas, T.¹  Brault, P.¹  Snyders, R.^3,5  Konstantinidis, S.⁵ 

[1] Univ Orleans, GREMI, F-45067 Orleans 2, France

[2] Univ Lyon 1, LMA, F-69622 Villeurbanne, France

[3] Univ Mons, ChIPS, B-7000 Mons, Belgium

[4] Univ Hassan 1, Ecole Super Technol, Berrechid 218, Morocco

[5] Mat Nova R&D Ctr, Mons, Belgium

关键词: Magnetron sputter deposition;    Superficial target heating;    IR emission;    Energetic contributions at the substrate;   

DOI  :  10.1016/j.tsf.2013.07.025

来源: Elsevier

【 摘 要 】

In this article, energy flux measurements at the substrate location are reported. In particular, the energy flux related to IR radiation emanating from the titanium(10 cm in diam.) target surface is quantified during magnetron sputter deposition processes. In order to modulate the plasma-target surface interaction and the radiative energy flux thereof, the working conditions were varied systematically. The experiments were performed in balanced and unbalanced magnetic field configurations with direct current (DC), pulsed DC and high power impulse magnetron sputtering (HiPIMS) discharges. The power delivered to the plasma was varied too, typically from 100 to 800 W. Our data show that the IR contribution to the total energy flux at the substrate increases with the supplied sputter power and as the discharge is driven in a pulse regime. In the case of HiPIMS discharge generated with a balanced magnetic field, the energy flux associated to the IR radiation produced by the target becomes comparable to the energy flux originating from collisional processes (interaction of plasma particles such as ions, electron, sputtered atoms etc. with the substrate). From IR contribution, it was possible to estimate the rise of the target surface temperature during the sputtering process. Typical values found for a titanium target are in the range 210 degrees C to 870 degrees C. (C) 2013 Elsevier B. V. All rights reserved.

【 授权许可】

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