期刊论文详细信息
THIN SOLID FILMS 卷:519
A modified layer-removal method for residual stress measurement in electrodeposited nickel films
Article
Jiang, L. M.1,2  Peng, J.1  Liao, Y. G.3  Zhou, Y. C.1  Liang, J.1  Hao, H. X.1  Lu, C.4 
[1] Xiangtan Univ, Key Lab Low Dimens Mat & Applicat Technol, Minist Educ, Xiangtan 411105, Hunan, Peoples R China
[2] Hunan Univ Technol, Coll Packaging & Mat Engn, Changsha 412007, Hunan, Peoples R China
[3] Univ S China, Fac Math & Phys, Hengyang 421001, Hunan, Peoples R China
[4] Curtin Univ, Dept Mech Engn, Perth, WA 6845, Australia
关键词: Layer-removal method;    Nickel;    Thin films;    Residual stress;    Nanoindentation;   
DOI  :  10.1016/j.tsf.2011.01.260
来源: Elsevier
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【 摘 要 】

Combining the traditional layer-removal method with a cantilever beam model, a modified layer-removal method is developed and used to measure residual stress in single and multi-layer electrodeposited nickel films with thickness of 2.5 mu m. The out-of-plane displacement of the free tip of a cantilever beam is measured by the digital speckle correlation method. The results show that residual stress in a single semimat nickel film is compressive, while in a multi-layer system composed of dark, semimat and holophote nickel, residual stress in the surface layer is tensile. Residual stress decreases gradually with the increase of etching depths of single and multi-layer films. These findings are in qualitative agreement with nanoindentation tests, which confirms the reliability of the modified layer-removal method. (C) 2011 Elsevier B.V. All rights reserved.

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