Growth mode transition of atomic layer deposited Al2O3 on porous TiO2 electrodes of dye-sensitized solar cells

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Article

Tien, Ta-Chang¹  Pan, Fu-Ming¹  Wang, Lih-Ping^2,3  Tsai, Feng-Yu⁴  Lin, Ching⁴ 

[1] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsingchu 300, Taiwan

[2] Ind Technol Res Inst, Green Energy & Environm Res Labs, Hsingchu 310, Taiwan

[3] Ind Technol Res Inst, Nanotechnol Res Ctr, Hsingchu 310, Taiwan

[4] Natl Taiwan Univ, Dept Mat Sci & Engn, Taipei 106, Taiwan

关键词: Growth mode;    Atomic layer deposition (ALD);    Core/shell nanoparticle;    Dye-sensitized solar cells;   

DOI  :  10.1016/j.tsf.2011.08.057

来源: Elsevier

【 摘 要 】

This study investigates the growth behavior of atomic-layer-deposited (ALD) Al2O3 overlayers on porous TiO2 electrodes, which comprise an anatase nanoparticle layer and a rutile particle layer, for optimizing dye-sensitized solar cells. The growth mode of the AID Al2O3 overlayers changes from island growth to layer-by-layer growth during the first few MD reaction cycles, and the growth mode transition is much more pronounced for the anatase electrode layer. The transition is likely a result of the reduction in the contractive lattice strain of the TiO2 nanoparticles. The lattice strain in the hydroxylated TiO2 nanoparticles is progressively reduced during the ALD Al2O3 deposition, resulting in the growth mode transition. (c) 2011 Elsevier B.V. All rights reserved.

【 授权许可】

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