Surface preparation of gold nanostructures on glass by ultraviolet ozone and oxygen plasma for thermal atomic layer deposition of Al2O3

THIN SOLID FILMS

卷:612

Article

Lancaster, Cady A.¹  Shumaker-Parry, Jennifer S.¹ 

[1] Univ Utah, Dept Chem, 315 S 1400 E,RM 2020, Salt Lake City, UT 84112 USA

关键词: Alumina;    Atomic layer deposition;    Substrate cleaning;    Gold nanostructures;    UV ozone;    Oxygen plasma;    Localized surface plasmon resonance;   

DOI  :  10.1016/j.tsf.2016.05.043

来源: Elsevier

【 摘 要 】

Thin film deposition to create robust plasmonic nanomaterials is a growing area of research. Plasmonic nanomaterials have tunable optical properties and can be used as substrates for surface-enhanced spectroscopies. Due to the surface sensitivity and the dependence of the near-field behavior on structural details, degradation from cleaning or spectroscopic interrogation causes plasmonic nanostructures to lose distinctive localized surface plasmon resonances or exhibit diminished optical near-field enhancements over time. To decrease degradation, conformal thin films of alumina are deposited on nanostructured substrates using atomic layer deposition. While film growth on homogenous surfaces has been studied extensively, atomic layer deposition-based film growth on heterogeneous nanostructured surfaces is not well characterized. In this report, we have evaluated the impact of oxygen plasma and ultraviolet ozone pre-treatments on Au nanoparticle substrates for thin film growth by monitoring changes in plasmonic response and nanostructure morphology. We have found that ultraviolet ozone is more effective than oxygen plasma for cleaning gold nanostructured surfaces, which is in contrast to bulk films of the same material. Our results show that oxygen plasma treatment negatively impacts the nanostructure and alumina coating based on both scanning electron microscopy analysis of morphology and changes in the plasmonic response. (C) 2016 Elsevier B.V. All rights reserved.

【 授权许可】

Free