Post-deposition catalytic-doping of microcrystalline silicon thin layer for application in silicon heterojunction solar cell

THIN SOLID FILMS

卷:635

Article; Proceedings Paper

Liu, Yong¹  Kim, Do Yun¹  Lambertz, Andreas¹  Ding, Kaining¹ 

[1] Forschungszentrum Julich, Photovolta IEK5, Wilhelm Johnen Str, D-52425 Julich, Germany

关键词: Catalytic-doping;    Shallow doping;    Microcrystalline silicon;    Conductivity;    Lifetime;    Heterojunction;   

DOI  :  10.1016/j.tsf.2017.02.003

来源: Elsevier

【 摘 要 】

The silicon heterojunction (SHJ) solar cell is one of the most promising candidates for the next-generation high-efficiency mainstream photovoltaic technology. It consists of a crystalline silicon wafer coated with a stack of functional thin-films on both sides. Conventionally, intrinsic and doped hydrogenated amorphous silicon (a-Si:H) is used as the passivation layer and emitter or back surface field (BSF), respectively. Hydrogenated microcrystalline silicon (mu c-Si:H) is considered as a more advantageous alternative to the a-Si:H emitter and BSF layers due to mu c-Si:H's higher electrical conductivity giving rise to lower series resistance. In this contribution, we use the catalytic doping process, so-called Cat-doping, to post-dope n-mu c-Si:H thin-layers in such a way that the conductivity can be increased to higher levels than those achievable in as-grown n-mu c-Si:H for the application in SHJ solar cells. We show that the conductivity of the mu c-Si:H films notably increases after the Cat-doping. We also investigated the impact of Cat-doping on the conductivity of the different mu c-Si:H and on lifetime. (C) 2017 Elsevier B.V. All rights reserved.

【 授权许可】

Free