PLASMA DIAGNOSTICS FOR THE CONTROL OF REACTIVE MAGNETRON DEPOSITION PROCESS

SURFACE & COATINGS TECHNOLOGY

卷:74-5

Article; Proceedings Paper

PERRY, F ; STAUDER, B ; HENRION, G ; PIGEAT, P

关键词: EMISSION SPECTROSCOPY;    MAGNETRON;    AL2O3 DEPOSITION;    PROCESS CONTROL;    COATING STOICHIOMETRY;   

DOI  :  10.1016/0257-8972(95)08334-0

来源: Elsevier

【 摘 要 】

Many plasma diagnostic methods are usually studied in laboratories in order to understand the fundamental processes that govern the plasma. This paper aims to study the potentialities of such diagnostics performed in a specific magnetron industrial-type deposition reactor in which the form of the time variation of the electrical plasma parameters (U(t); I(t)) depends on the mean power applied to the electrodes. In particular, Langmuir probe and optical emission spectroscopy (OES) measurements are carried out in the case of aluminium nitride and oxide deposition. Ex-situ coating analysis is performed by means of optical microscopy, scanning electron microscopy, microprobe analysis and Auger spectroscopy. In this paper we show that the Langmuir probe is not a well-adapted diagnostic method to study such reactive plasmas. Indeed, the high deposition rate implies a fast modification of the probe geometry and electrical properties due to the deposition of a thin film on the probe tip. On the other hand, OES measurements are related to the stoichiometry of the deposited coatings. Some phenomenological interrelations between the mean lines intensity and the coating stoichiometry are found, which may be used to control the deposition process.

【 授权许可】

Free