Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbons

SURFACE & COATINGS TECHNOLOGY

卷:409

Article

da Silva Oliveira, C., I¹  Martinez-Martinez, D.¹  Cunha, L.¹  Lanceros-Mendez, S.^1,2,3  Martins, P.¹  Alves, E.⁴  Barradas, N. P.⁵  Apreutesei, M.⁶ 

[1] Univ Minho & Porto, Ctr Phys, Braga, Portugal

[2] Basque Ctr Mat Applicat & Nanostruct BCMat, UPV EHU Sci Pk, Leioa 48940, Spain

[3] IKERBASQUE, Basque Fdn Sci, Bilbao 48013, Spain

[4] Univ Lisbon, Inst Plasmas & Fusao Nucl, Inst Super Tecn, Lisbon, Portugal

[5] Univ Lisbon, Ctr Ciencias & Tecnol Nucl, Inst Super Tecn, Lisbon, Portugal

[6] INSA Lyon, MATEIS Lab, Villeurbanne, France

关键词: Oxynitride;    Sputtering;    Titanium;    Zirconium;    Color;   

DOI  :  10.1016/j.surfcoat.2020.126737

来源: Elsevier

【 摘 要 】

In this work, we explore the addition of Ti ribbons on the racetrack of a Zr target to prepare Zr-O-N films including Ti, by reactive magnetron sputtering with a mixture of N-2 and O-2 as reactive gases. This approach is simple and not invasive, it avoids the modification of the target and minimizes its contamination. These films were compared in terms of chemical composition, density, film growth and crystallographic structure with others prepared in identical conditions without Ti ribbons. In addition, the composition and density of the films were correlated with crystallographic references from literature. The color and electrical properties of the films were evaluated as well. It was observed that poisoning of the Zr target is promoted by the increase of the N-2 + O-2 flow and the reduction of magnetron current, but it is retarded by the introduction of the Ti ribbons. This effect was particularly remarkable at lower target current, since the sputtering is confined in areas nearer to the racetrack, where the Ti ribbons are located. To account for the poisoning of the target and compare it among the different samples, a 'poisoning parameter' was defined, using a combination of the chemical composition of the films and the deposition rates. The color and electrical properties of the films correlate surprisingly well with their oxygen-to-metal ratio, while the concentration of N does not seem to play any significant role.

【 授权许可】

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