Zr-O-N coatings for decorative purposes: Study of the system stability by exploration of the deposition parameter space

SURFACE & COATINGS TECHNOLOGY

卷:343

Article; Proceedings Paper

da Silva Oliveira, C. I.¹  Martinez-Martinez, D.¹  Cunha, L.¹  Rodrigues, M. S.¹  Borges, J.¹  Lopes, C.¹  Alves, E.²  Barradas, N. P.³  Apreutesei, M.⁴ 

[1] Univ Minho, Ctr Phys, Campus Azurem, P-4800058 Guimaraes, Portugal

[2] Univ Lisbon, Inst Super Tecn, Inst Plasmas & Fusao Nucl, Bobadela Lrs, Portugal

[3] Univ Lisbon, Inst Super Tecn, Ctr Ciencias & Tecnol Nucl, Bobadela Lrs, Portugal

[4] INSA Lyon, MATEIS Lab, Villeurbanne, France

关键词: Decorative;    Oxynitride;    XRD;    Zirconium;    RBS;    Aesthetic;   

DOI  :  10.1016/j.surfcoat.2017.11.056

来源: Elsevier

【 摘 要 】

The deposition of decorative coatings is an excellent solution to modify the surface of any material, particularly the aesthetic finishing, without altering the properties of the substrate. Transition metal oxynitride films are interesting for many applications, due the simple and economic way to tune between nitride and oxide bonding. In reactive sputtering, this is done by playing with the flows of N-2 and O-2, leading to variations of properties (e.g. color) in different directions. In this paper, zirconium is selected as transition metal due to the combination of different characteristics (color, biocompatibility, mechanical properties, corrosion resistance). The literature about Zr-O-N films reveals a confinement of chemical composition. Therefore, the aim of this work is the exploration of the deposition parameter space in order to evaluate the stability of the Zr-O-N system, i.e. verify if the chemical composition of the films still falls in the same range after variation of different deposition parameters. To do that, a series of Zr-O-N films is deposited first at different reactive flows, maintaining the remaining deposition parameters constant. The obtained films can be classified in three different groups, based on their chemical composition, crystalline structure, and film growth. These groups can be successfully explained according to the sputtering characteristics, and correlated with the mechanical properties and color of the films measured by nanoindentation and spectrophotometry respectively. The films deposited by variation of other parameters are introduced afterwards and their characteristics are compared with the reference series.

【 授权许可】

Free