Determination of Sb(III) using an ex-situ bismuth screen-printed carbon electrode by adsorptive stripping voltammetry

TALANTA

卷:155

Article

Rojas-Romo, Carlos^1,2  Serrano, Nuria¹  Arino, Cristina¹  Arancibia, Veronica²  Manuel Diaz-Cruz, Jose¹  Esteban, Miguel¹ 

[1] Univ Barcelona, Fac Quim, Dept Quim Analit, Marti & Franques 1-11, E-08028 Barcelona, Spain

[2] Pontificia Univ Catolica Chile, Fac Quim, Vicuna Mackenna 4860, Santiago 7820436, Chile

关键词: Determination of antimony;    Quercetin-5 '-sulfonic acid;    Screen-printed electrode;    Bismuth film electrode;    Adsorptive stripping voltammetry;   

DOI  :  10.1016/j.talanta.2016.04.015

来源: Elsevier

【 摘 要 】

The determination of Sb(III) on an ex-situ bismuth screen-printed carbon electrode (ex-situ BiSPCE) by means of adsorptive stripping voltammetry (AdSV) using quercetin-5'-sulfonic acid as chelating agent was optimized. The effect of different experimental parameters such pH, ligand concentration (CosA), accumulation potential (E-acc) and accumulation time (t(acc)) were studied to obtain a wide linear range, the highest sensitivity and the lowest detection limit. Ex-situ BiSPCE was analytically compared with a sputtered bismuth screen-printed electrode (BispSPE) under optimal conditions. The obtained analytical parameters suggest that ex-situ BiSPCE behaves much better than BispSPE and the first was selected for this study. Optimal parameters were pH=4.6; C-QSA=10.0 to 20.0 x 10(-6) mol L-1; E-acc = -0.5 V and t(acc) = 60 s. Peak area is proportional to Sb(III) concentration up to 100.0 mu g L-1 (t(acc) 60 s) and 45.0 mu g L-1 (t(acc) 120 s) range, with detection limits of 1.214 (t(acc) 60 s) and 0.8 mu g L-1 (t(acc) 120 s). The relative standard deviation for a Sb(III) solution (20.0 mu g L-1) was 3.9% for ten successive assays. Thus, the effect of various interfering metal ions was studied and the methodology was validated using a spiked groundwater reference material with very satisfactory results. (C) 2016 Elsevier B.V. All rights reserved.

【 授权许可】

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